Fig. 2From: Effect of the Niobium-Doped Titanium Oxide Thickness and Thermal Oxide Layer for Silicon Quantum Dot Solar Cells as a Dopant-Blocking LayerCross-sectional HRTEM images of a Si-QDML/TiOx:Nb/thermal oxide/n++-poly-Si structure and b Si-QDML. The inset in (b) is the electron diffraction patternBack to article page