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Table 1 Recipe for ALD development of ZnO nanofilms using (C₂H₅)₂Zn and H₂O precursors

From: Nanoscale Au-ZnO Heterostructure Developed by Atomic Layer Deposition Towards Amperometric H₂O₂ Detection

Parameters	Deposition
Parameters	1	2
Inner heater (°C)	250	250
Outer heater (°C)	250	250
Zn precursor heater (°C)	250	250
Isolate pump	✔	✔
Exposure	–	–
Flow (sccm)	30	30
Pulse H₂O (Sec)	0.1	0.1
Exposure (sec)	10	10
Initiate pump	✔	✔
Purge H₂O (Sec)	15	15
Isolate pump	–	–
Pulse Zn precursor (Sec)	0.06	0.06
Exposure	–	–
Initiate pump	–	–
Purge Zn precursor (Sec)	10	10
Number of cycles	16 (0.9 nm)	23 (1.3 nm)

(✔) Process is carried out; (–) process is exempted

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