Fig. 2From: Synthesis of Vertically Aligned ZnO Nanorods Using Sol-gel Seeding and Colloidal Lithography PatterningAFM images of ZnO NP seed layers prepared on top of a Si wafer by a sol-gel method after a one- and b two-step dip-coatings, respectively, followed by an annealing step at 300 °C after each coating. A polynomial background has been subtracted from the AFM imagesBack to article page