Table 1 A summary of H2S response of metal-loaded SnO2 and CuO/SnO2 nanomaterials prepared by various methods
Materials | Form | Technical used | Gas conc. (ppm)/Temp (°C) | H2S Response | Refs |
---|---|---|---|---|---|
3.0 mol% Ag–SnO2 | Thick film | Spray pyrolysis | 450/100 | 1.38 | [10] |
0.1 wt% V–SnO2 | Thick film | Flame spray pyrolysis and spin coating | 10/350 | 2.27 × 103 | [11] |
0.5 wt% Mo–SnO2 | Thick film | Flame spray pyrolysis and spin coating | 10/250 | ≈105 | [12] |
Sb–SnO2 nanoribbons | Thin film | Thermal evaporation | 100/150 | ≈55 | [13] |
0.64 at% Fe–SnO2 | Thin film | Rheotaxial grown and Thermal oxidation | 10/225 | 14.5 | [14] |
Cu-doped SnO2 | Thick film | Ultrasonic spray pyrolysis | 95.9/100 | 7.24 × 103 | [15] |
2mol% Cu–SnO2 | Thick film | Hydrothermal and drip coating | 300/300 | 40 | [16] |
Cu–SnO2 nanowires | Thin film | Thermal evaporation | 10/150 | 5 × 105 | [17] |
1 at% Cu–SnO2 | Thick film | Electrostatic sprayed | 10/100 | 2.5 × 103 | [18] |
SnO2/CuO islands | Thin film | Sputtering | 5/250 | 128 | [19] |
CuO-loaded SnO2 | Thick film | Ultrasonic spray pyrolysis | 1/300 | 22.4 | [20] |
CuO/SnO2 | Thin film | Chemical vapour deposition | 10/250 | 26.3 | [21] |
3 vol% CuO–SnO2 | Thin film | Pulsed laser deposition | 20/140 | 2.7 × 104 | [22] |
CuO-loaded SnO2 | Thin film | Electrospinning | 10/300 | 1.98 × 104 | [23] |
5 mol% CuO/SnO2 | Thin film | Co-dissolution and electrospinning | 1/200 | ≈23 | [24] |
SnO2–CuO | Thin film | Sputtering | 20/150 | 8 × 103 | [25] |
CuO–SnO2 | Thin film | Pulsed laser deposition | 20/100 | 2.3 × 103 | [26] |
CuO–SnO2 nanowire | Thick film | Thermal evaporation | 20/300 | 809 | [27] |
CuO–SnO2 | Thick film | Precipitation/Impregnation and drop coating | 50/200 | 6.7 | [28] |
20 wt% CuO/SnO2 | Thick film | Precipitation/Impregnation and spin coating | 10/200 10/150 | 1.359 × 105 3.1 × 104 | This work |