Fig. 3From: Post-annealing Effect on Optical and Electronic Properties of Thermally Evaporated MoOX Thin Films as Hole-Selective Contacts for p-Si Solar CellsMo 3d core-level XPS spectra of the 10-nm-thick MoOX films on silicon wafers a without post-annealing, with post-annealing at b 100 °C, c 200 °C and d 300 °CBack to article page