Fig. 4
From: Synaptic Behaviors in Ferroelectric-Like Field-Effect Transistors with Ultrathin Amorphous HfO2 Film

Post-synaptic ID of the device underwent multiple VG input pulses within the relative refractory period
From: Synaptic Behaviors in Ferroelectric-Like Field-Effect Transistors with Ultrathin Amorphous HfO2 Film
Post-synaptic ID of the device underwent multiple VG input pulses within the relative refractory period