Table 2 Comparison of the electrochemical performance of Cr-doped Mo₂N film electrodes with other reported metal nitride-based electrode materials

1

TiN

Direct current magnetron sputtering

0.5 M K₂SO₄

146.4 F cm⁻³

–

[15]

2

RuN

Reactive sputtering

1 M LiPF₆

37 F/g

–

[20]

3

Ni₂Mo₃N

Ammonolysis synthesis

6 M KOH

264 C/g

81.4%@1000 cycles

[24]

4

Ni₃N

Radio-frequency magnetron sputtering

3 M KOH

319 mF cm⁻²

93.7%@2000 cycles

[25]

5

γ-Mo₂N

DC sputtering

0.5 M Li₂SO₄

722 F/cm³

100%@2000 cycles

[33]

6

MoN_x@NF

Atomic layer deposition (ALD)

1 M KOH

130 mC/cm²

100%@8000

[48]

7

Ni-Co₄N@NC

In situ nitridation process

1 M KOH

397.5 mAh/g

72.4%@10,000 cycles

[50]

8

Mo₃N₂

Reactive magnetron co-sputtering

1 M KOH

173.4 mF cm²

–

[51]

9

Cu/Mo₃N₂

Reactive magnetron co-sputtering

1 M KOH

619.5 mF cm²

80%@2000 cycles

[51]

10

Ni-doped Co–Co₂N

Chemical synthesis

1 M KOH

361.93 C/g

82.4%@5000 cycles

[52]

11

W₂N (thick coating)

Sputtering technique

1 M KOH

0.55 F cm⁻² 700 F cm⁻³

10,000 cycles

[53]

12

MoN/TiN

Electrodeposition/nitridation treatment in NH₃

1 M LiOH

121.50 mF cm⁻²

93.8%@1000 cycles

[54]

13

VN

DC plasma reactive sputtering

1 M KOH

238.2 mF cm⁻²

77.5%@2000 cycles

[55]

14

Ni_0.2Mo_0.8N

Facile and simple nitridation process

6 M KOH

2446 mC/cm²

80.1%@6000 cycles

[56]

15

Mn₃N₂

Direct current magnetron sputtering

Different electrolytes

118, 68 & 27 mF cm⁻²

98.5% (KOH), 89% (KCl) and 83% (Na₂SO₄) @4000 cycles

[57]

16

CrN

Direct current magnetron sputtering

0.5 M H₂SO₄

40.53 mF cm⁻²

95.3%@2000 cycles

[58]

17

CrN

Direct current magnetron sputtering

0.5 M Na₂SO₄

32.69 mF cm⁻²

93.8%@2000 cycles

[58]

18

CrN

Direct current magnetron sputtering

0.5 M NaCl

9.17 mF cm⁻²

89.9% 93.8%@2000 cycles

[58]

19

TiN/C

Reactive sputtering

0.5 M H₂SO₄

45.81 mF cm⁻²

85%@5000 cycles

[59]