Table 2 Comparison of the electrochemical performance of Cr-doped Mo2N film electrodes with other reported metal nitride-based electrode materials
From: Sputter-Deposited Binder-Free Nanopyramidal Cr/γ-Mo2N TFEs for High-Performance Supercapacitors
No. | Materials | Synthesis method | Electrolyte | Areal or specific capacitance/capacity | Capacitance/capacity retention with number of cycles | References |
---|---|---|---|---|---|---|
1 | TiN | Direct current magnetron sputtering | 0.5 M K2SO4 | 146.4 F cm−3 | – | [15] |
2 | RuN | Reactive sputtering | 1 M LiPF6 | 37 F/g | – | [20] |
3 | Ni2Mo3N | Ammonolysis synthesis | 6 M KOH | 264 C/g | 81.4%@1000 cycles | [24] |
4 | Ni3N | Radio-frequency magnetron sputtering | 3 M KOH | 319 mF cm−2 | 93.7%@2000 cycles | [25] |
5 | γ-Mo2N | DC sputtering | 0.5 M Li2SO4 | 722 F/cm3 | 100%@2000 cycles | [33] |
6 | MoNx@NF | Atomic layer deposition (ALD) | 1 M KOH | 130 mC/cm2 | 100%@8000 | [48] |
7 | Ni-Co4N@NC | In situ nitridation process | 1 M KOH | 397.5 mAh/g | 72.4%@10,000 cycles | [50] |
8 | Mo3N2 | Reactive magnetron co-sputtering | 1 M KOH | 173.4 mF cm2 | – | [51] |
9 | Cu/Mo3N2 | Reactive magnetron co-sputtering | 1 M KOH | 619.5 mF cm2 | 80%@2000 cycles | [51] |
10 | Ni-doped Co–Co2N | Chemical synthesis | 1 M KOH | 361.93 C/g | 82.4%@5000 cycles | [52] |
11 | W2N (thick coating) | Sputtering technique | 1 M KOH | 0.55 F cm−2 700 F cm−3 | 10,000 cycles | [53] |
12 | MoN/TiN | Electrodeposition/nitridation treatment in NH3 | 1 M LiOH | 121.50 mF cm−2 | 93.8%@1000 cycles | [54] |
13 | VN | DC plasma reactive sputtering | 1 M KOH | 238.2 mF cm−2 | 77.5%@2000 cycles | [55] |
14 | Ni0.2Mo0.8N | Facile and simple nitridation process | 6 M KOH | 2446 mC/cm2 | 80.1%@6000 cycles | [56] |
15 | Mn3N2 | Direct current magnetron sputtering | Different electrolytes | 118, 68 & 27 mF cm−2 | 98.5% (KOH), 89% (KCl) and 83% (Na2SO4) @4000 cycles | [57] |
16 | CrN | Direct current magnetron sputtering | 0.5 M H2SO4 | 40.53 mF cm−2 | 95.3%@2000 cycles | [58] |
17 | CrN | Direct current magnetron sputtering | 0.5 M Na2SO4 | 32.69 mF cm−2 | 93.8%@2000 cycles | [58] |
18 | CrN | Direct current magnetron sputtering | 0.5 M NaCl | 9.17 mF cm−2 | 89.9% 93.8%@2000 cycles | [58] |
19 | TiN/C | Reactive sputtering | 0.5 M H2SO4 | 45.81 mF cm−2 | 85%@5000 cycles | [59] |