Figure 3

(a) Voltage waveform applied to the GaAs surface with respect to the AFM probe when performing an oxidation under AC conditions: T _ox is the time as the oxidation is being performed (the voltage applied to the sample is V _ox), and T _res is the rest time (the voltage applied is V _res); (b) the comparison of the oxide height and AFM images of oxide dots by the two different types of AFM tip under DC and AC conditions, right (DC voltage of 8 V and total time = 30 s) and left (AC voltage, T _ox = T _res = 50 ms,V _ox = 8 V,V _res = −8 V and total time = 60 s), at the relative humidity of 55%