Table 1 PSZT thin film deposition conditions
From: Nanocolumnar Preferentially Oriented PSZT Thin Films Deposited on Thermally Grown Silicon Dioxide
Target | (Pb0.92Sr0.08)(Zr0.65Ti0.35)O3 |
Target diameter | 100 mm |
RF power | 100 W |
Target to substrate distance | 70 mm |
Process gas | 10% oxygen in argon |
Base pressure | 9.0 × 10−6 Torr |
Sputtering pressure | 1.0 × 10−2 Torr |