Figure 1From: Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch MaskFabrication process flow for tapered subwavelength antireflection structures:a Pt/Pd alloy thin film deposition with a thickness of 10 nm;b thermally dewetted Pt/Pd alloy nanodot etch mask formed at an elevated temperature; andc formation of tapered subwavelength antireflection structures after RIEBack to article page