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Figure 1 | Nanoscale Research Letters

Figure 1

From: 3D Simulation of Nano-Imprint Lithography

Figure 1

Illustration of the NIL process simulated with the present numerical method. The green domain represents the polymer cast onto a hard substrate and the grey domain represents the cavities patterned in the stamp. The dimensionless aspect ratio, relative to the initial thickness of the sample T, is H/T = 4. The separation between cavities is L/T = 20. The blue line denote the simulated domain

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