Figure 1From: Nanogrids and Beehive-Like Nanostructures Formed by Plasma Etching the Self-Organized SiGe IslandsFabrication procedures of quasi-beehive Si nanostructures and self-organized nanogrids: a SiGe thin film is deposited on Si substrate; b SiGe islands arrays are formed via the annealing treatment; c then plasma etching (RIE); d finally the self-organized nanostructures are fabricatedBack to article page