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Figure 1 | Nanoscale Research Letters

Figure 1

From: Periodically Aligned Si Nanopillar Arrays as Efficient Antireflection Layers for Solar Cell Applications

Figure 1

Schematic illustration of fabrication process of PASiNP arrays: a creation of planar silicon p–n junction wafer via a standard phosphorus (POCl3) doping process at 930°C; b self-assembly of PS spheres on silicon wafer; c reduction in the diameter of PS spheres by a RIE process; d deposition of silver film; e fabrication of PASiNP arrays in the mixture solution of HF and H2O2; and f removal of residual PS spheres and silver particles

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