Figure 2From: Selective patterning of ZnO nanorods on silicon substrates using nanoimprint lithography SEM images of nanopattern from NIL results on the SiO 2 /Si substrates including a square lattice of circular pillars of 300 nm diameter with a 200 nm pitch. before (a) and after (b) reactive ion etching, lines of 300 nm width with a pitch of 200 nm before (c) and after (d) reactive ion etching.Back to article page