Efficient visible luminescence of nanocrystalline silicon prepared from amorphous silicon films by thermal annealing and stain etching

Table 1 Preparation parameters of the annealed samples and data on the mean size and volume fraction of nc-Si obtained from the Raman spectra analysis.

Sample	Annealing conditions			Mean size of nc-Si (nm)	Volume fraction of nc-Si to amorphous Si (%)
	Method	T (°C)	Duration
#1	RTA	900	40 s	3.9	44
#2	RTA	950	50 s	5.0	88
#3	FA	950	30 min	8.0	90