Figure 3From: Simultaneous fabrication of line defects-embedded periodic lattice by topographically assisted holographic lithography The effect of temperature on TAHL process. Microscopic images and surface profiles of the embossed PR patterns at temperatures of (a) 70°C, (b) 90°C, and c) 110°C. FE-SEM cross-sectional views after single interference lithography and subsequent development with the embossed PR at temperatures of (d) 70°C, (e) 90°C and (f) 110°C.Back to article page