Figure 2

2D and 3D views of AFM images and cross-sectional line-profiles of: (a). bare-Si , (b) conventional wet chemical etching of square-masked Si, (c) ICP-etched Si using MWCNT-dispersion in isopropyl-alcoholand (d) ICP-etched Si using MWCNT-dispersion in HMDS. Corresponding line-profilers are indicated as white lines in 2D AFM images with the corresponding alphabetical letters in (a-d). 2D and 3D AFM images are 4 (x) × 4 (y) μm².