Figure 2
From: Gold colloidal nanoparticle electrodeposition on a silicon surface in a uniform electric field
In-plane distribution of the gold colloids. (a-d) SEM plane views of a <111>-oriented silicon substrate after electromigration of gold nanoparticles with a diameter D = 20 nm for different deposition times t at a voltage V = 40V, (e) self-correlation function g(r) from (d) with r 0 = 46.9 nm, (f) cross section (1) from (e) and (2) from (c), (g) evolution of r 0 with deposition time.