Figure 4From: Si nanowires by a single-step metal-assisted chemical etching process on lithographically defined areas: formation kinetics SEM images of SiNWs formed on the blank Si wafer and on lithographically defined areas. Cross-sectional SEM images of SiNWs fabricated on non-patterned Si areas (a) and on 100 × 100-μm2 lithographically defined areas (b).Back to article page