Figure 2From: A general lithography-free method of microscale/nanoscale fabrication and patterning on Si and Ge surfacesEndoepitaxial growth of silicide or germanide nanostructures with shape and orientation controls. The upper row shows the SEM images of wire-, square- and triangle-like copper silicide nanostructures grown on (a) Si(110), (b) Si(100), and (c) Si(111) substrates, respectively. Insets show the magnified views of individual nanostructures. The lower row shows the SEM images of shape-controlled iron germanide nanostructures grown on (d) Ge(110), (e) Ge(100), and (f) Ge(111) substrates, respectively.Back to article page