Figure 8From: Fabrication mechanism of friction-induced selective etching on Si(100) surfaceXTEM detection on the cross-sectional microstructure of the scratched area of Si(100) surface. (a) XTEM microstructures of the scratch produced by 300 cycles of line scratch under Fn = 30 μN. The upper left inset picture shows the high-resolution microstructure of the original silicon surface. (b) High-resolution microstructure of the scratched area on the silicon surface.Back to article page