Figure 5From: Catalytic activity of noble metals for metal-assisted chemical etching of siliconEtching rate of metal particle-deposited Si wafers versus oxygen fraction in bubbling gas. HF solution was bubbled with a mixture of pure argon (Ar) and pure O2. The following marks represent the deposited metals: triangles, Ag; diamonds, Au; squares, Pt; and circles, Rh.Back to article page