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Figure 3 | Nanoscale Research Letters

Figure 3

From: Triangle pore arrays fabricated on Si (111) substrate by sphere lithography combined with metal-assisted chemical etching and anisotropic chemical etching

Figure 3

SEM images of macroporous silicon formed by metal-assisted chemical etching. SEM images of Au-coated (111) silicon after chemical etching in 15 mol dm−3 HF/1 mol dm−3 H2O2 for 1 min using (a, b) polystyrene honeycomb mask and (c to e) photoresist honeycomb mask. The periodicity of the openings of the mask was 3 μm in both cases. (b, e) Cross-sectional images of macroporous silicon shown in (a) and (d).

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