Fabrication of porous silicon by metal-assisted etching using highly ordered gold nanoparticle arrays

Table 1 Key parameters of gold nanoparticle arrays prepared on silicon using different fabrication strategies

	Diameter (nm)	Interparticle distance (nm)
Piranha treatment	52 ± 9	111 ± 13
Piranha treatment + plasma treatment	55 ± 8	110 ± 12
Piranha treatment + flame annealing	56 ± 10	111 ± 18
HF treatment	56 ± 11	106 ±12
HF treatment + plasma treatment	-^a	-^a
HF treatment + flame annealing	54 ± 9	105 ± 15

^aThe diameter of the gold nanoparticles and their interparticle distances were not determined as the polymer matrix could not be completely removed with the chosen plasma conditions. Hence, the samples have not been used for metal-assisted etching.