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Figure 1 | Nanoscale Research Letters

Figure 1

From: Lithography-free fabrication of silicon nanowire and nanohole arrays by metal-assisted chemical etching

Figure 1

Schematic of the SiNW and SiNH array fabrication process. (a) Ag film is fabricated by thermal evaporation on a Si substrate. (b) Ag film with regular holes after relatively low-temperature thermal treatment. (c, d) SiNW arrays achieved after MaCE corresponding to (b). (e) Ag nanoparticles with uniform shape after relatively high-temperature thermal treatment. (f, g) SiNH arrays achieved after MaCE corresponding to (d).

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