Figure 7From: Modification of the optical and structural properties of ZnO nanowires by low-energy Ar+ ion sputteringHR-TEM micrographs of ZnO nanowires irradiated with a fluence of 1017cm−2. Showing (a) an example of the etched surface (in this case, the removed material layer depth is about 10 nm). In (b, c), redeposited crystalline particles, with different orientations in the cross-sectional surface and the inner region of the wire, respectively, are observed.Back to article page