Figure 4From: The fabrication of large-scale sub-10-nm core-shell silicon nanowire arraysSEM images of samples after the metal catalytic etching. (a) SEM image of SiNW arrays after 5-min solution etching. (b) Gauss fit of the dimension of the spheres, holes, and top and bottom of nanowires. (c), (d) SEM images of samples using 200-nm PS sphere template; the samples have been etched by solution for 2 and 5 min, respectively.Back to article page