Figure 1From: Hydrogen evolution reaction measurements of dealloyed porous NiCuCopper composition in electrodeposited NiCu thin films. Copper composition in the electrodeposited films as determined by EDS as a function of the copper composition in the deposition solution. Each point represents a single sample, and the error bars are the typical EDS uncertainty. The dashed line indicates equal composition in the solution and in the film.Back to article page