Figure 5From: Si nanopatterning by reactive ion etching through an on-chip self-assembled porous anodic alumina maskPlane view SEM images of the Si surface of sample 1. The images show the nanopatterned Si surface of sample 1 after etching through the PAA mask using SF6/CHF3 gas mixture for 20 s (a), 40 s (b), and 60s (c). The alumina film was removed before observation.Back to article page