Figure 5From: Pulsed laser-induced formation of silica nanogridsGrids with wire diameters at the nanoscale. (a) Grid pattern generated in a 144-nm-thick SiO x film using a laser wavelength of 248 nm and a fluence of 300 mJ/cm2. (b) Grid pattern generated in a 28-nm-thick SiO x film using a laser wavelength of 193 nm and a fluence of 130 mJ/cm2.Back to article page