Figure 6
From: Nanofabrication on monocrystalline silicon through friction-induced selective etching of Si3N4 mask
Fabrication of large-area texture and contact angle tests. (a) SEM image of the original Si(100) surface; the contact angle is tested at 47°. (b) SEM image of the Si(100) surface with texture, which was fabricated by nanoscratching under Fn = 50 mN and post-etching in HF solution for 30 min and KOH solution for 2 h in sequence; the contact angle is 114°. (c) AFM 3D-morphology of the partial texture in (b).