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Table 1 Varying dopant concentrations at constant temperature, growth time, and flow rate of O 2

From: A catalyst-free growth of aluminum-doped ZnO nanorods by thermal evaporation

Number

Growth time (min)

Growth temperature (°C)

Flow rate of O2gas (sccm)

Dopant concentration (at.%)

1

120

700

200

0

2

120

700

200

0.6

3

120

700

200

1.2

4

120

700

200

2.4

5

120

700

200

4.7

6

120

700

200

11.3

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