Table 1 Thickness evolution of the thin films obtained by ISS process
Fabrication process | Thickness (nm) | LSPR (λmax; Amax) |
---|---|---|
[PAH(9.0)/PAA(9.0)]40 | 288 ± 5 | - |
[PAH(9.0)/PAA(9.0)]40 + 1 L/R cycle | 291 ± 4 | 421.3 nm; 0.04 |
[PAH(9.0)/PAA(9.0)]40 + 2 L/R cycles | 289 ± 16 | 422.1 nm; 0.09 |
[PAH(9.0)/PAA(9.0)]40 + 3 L/R cycles | 296 ± 8 | 422.8 nm; 0.79 |
[PAH(9.0)/PAA(9.0)]40 + 4 L/R cycles | 294 ± 8 | 424.6 nm; 1.07 |