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Table 4 Thickness evolution of the thin films obtained LbL-E deposition technique after thermal treatment

From: A comparative study of two different approaches for the incorporation of silver nanoparticles into layer-by-layer films

Fabrication process

Temperature

Thickness (nm)

LSPR (λmax; Amax)

[PAH(9.0)/PAA-AgNPs(9.0)]40

Ambient

642 ± 12

432.6 nm; 1.18

[PAH(9.0)/PAA-AgNPs(9.0)]40

50°C

611 ± 16

432.6 nm; 1.20

[PAH(9.0)/PAA-AgNPs(9.0)]40

100°C

600 ± 12

432.6 nm; 1.26

[PAH(9.0)/PAA-AgNPs(9.0)]40

150°C

552 ± 9

432.6 nm; 1.68

[PAH(9.0)/PAA-AgNPs(9.0)]40

200°C

452 ± 10

446.9 nm; 1.66

  1. Thickness evolution of the LbL-E thin films and the location of the LSPR absorption bands (λmax) with their maxima absorbance values (Amax) as a function of the temperature.

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