Table 4 Thickness evolution of the thin films obtained LbL-E deposition technique after thermal treatment
Fabrication process | Temperature | Thickness (nm) | LSPR (λmax; Amax) |
---|---|---|---|
[PAH(9.0)/PAA-AgNPs(9.0)]40 | Ambient | 642 ± 12 | 432.6 nm; 1.18 |
[PAH(9.0)/PAA-AgNPs(9.0)]40 | 50°C | 611 ± 16 | 432.6 nm; 1.20 |
[PAH(9.0)/PAA-AgNPs(9.0)]40 | 100°C | 600 ± 12 | 432.6 nm; 1.26 |
[PAH(9.0)/PAA-AgNPs(9.0)]40 | 150°C | 552 ± 9 | 432.6 nm; 1.68 |
[PAH(9.0)/PAA-AgNPs(9.0)]40 | 200°C | 452 ± 10 | 446.9 nm; 1.66 |