Figure 11From: Tuning of strain and surface roughness of porous silicon layers for higher-quality seeds for epitaxial growthRMS values of the LPL surfaces of the annealed PSi double layer. RMS values of surface roughness of the annealed double layer of PSi, with 750- and 1,300-nm thick LPL, as a function of annealing time (1, 5, 10 and 30 min). The roughness increases slightly from 1 to 10 min and becomes unstable for longer times.Back to article page