Table 1 Etching conditions of all the investigated samples for the three different studies of the impact of layer thickness, annealing time, and pillars on strain and surface roughness
Parameters | Impact of thickness | Impact of annealing time | Pillars evolution | |||||||
|---|---|---|---|---|---|---|---|---|---|---|
PSi stack | Monolayer | Double layer | Double layer | Double layer | ||||||
LPL | HPL | LPL | HPL | LPL | HPL-1 | STDHPL | HPL-2 | |||
Current density [mA/cm2] | 1.4 | 1.4 | 73 | 1.4 | 73 | 1.4 | 50 | 73 | 97 | |
Porosity [%] | 30 ± 5 | 30 ± 5 | 55 ± 5 | 30 ± 5 | 55 ± 5 | 30 ± 5 | ND | 55 ± 5 | ND | |
Etching time [s]/thickness [nm] | 150/350 | 30% ± 5% | 6/300 | (I) | 300/750 | 6/300 | 300/750 | 8/300 | 6/300 | 4/300 |
300/750 | 50/150 | |||||||||
600/1300 | 150/350 | |||||||||
900/1700 | 300/750 | |||||||||
450/900 | (II) | 600/1300 | 6/300 | |||||||
600/1300 | ||||||||||
900/1700 | ||||||||||
1200/2000 | ||||||||||