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Figure 6 | Nanoscale Research Letters

Figure 6

From: Released micromachined beams utilizing laterally uniform porosity porous silicon

Figure 6

Comparison of pore fill techniques utilizing ProLIFT and SOG. Different techniques: (a) ProLIFT pore filling technique with short developing time, (b) ProLIFT pore filling technique with long developing time and (c) SOG pore filling technique. At three steps: (I) UV light exposure with photoresist patterning, (II) developing to remove exposed positive photoresist and (III) RIE and photoresist/pore filling material removal.

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