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Figure 1 | Nanoscale Research Letters

Figure 1

From: The mechanism of galvanic/metal-assisted etching of silicon

Figure 1

Band bending at the metal/p-type Si interface for (a) Ag, (b) Au, (c) Pt, and (d) Pd. Evac = the vacuum energy. ΦM = metal work function. ΦSi = Si work function. E g = Si band gap. E F = Fermi energy. E C = Si conduction band energy. E V = Si valence band energy. ΦD = maximum band bending. The value E indicates the energy of the Si valence band directly at the metal/Si interface. E b , p ideal is the Schottky barrier height from Equation 4.

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