Figure 1

Fabrication process. (a) Silicon substrate coated with Pt/Ti (150/10 nm) is cleaned with acetone and deionized water; (b) schematic of growth of BaTiO₃ thin films by aerosol deposition using different starting powder; inset pictures show the SEM images of the starting powder (b-i) BT-045J and (b-ii) BT-03B (with a particle size of 0.45 and 0.3 μm, respectively); and (c) 0.2-μm-thick as-deposited BaTiO₃ thin films annealed at 550, 650, and 750°C for 60 s.