Figure 1From: Forming-free bipolar resistive switching in nonstoichiometric ceria filmsXRD pattern of the CeO x film and cross-sectional TEM and EDX images of the Zr/CeO x /Pt device. (a) XRD pattern of the CeO x film deposited on Si wafer at room temperature. (b) Cross-sectional TEM image of the Zr/CeO x /Pt device. (c) EDX image of the Zr/CeO x /Pt device.Back to article page