Figure 2From: Broadband antireflective silicon nanostructures produced by spin-coated Ag nanoparticlesProcess steps to fabricate Si nanostructures and Ag ink ratio-dependent distribution of Ag nanoparticles. (a) Fabrication procedure for forming Si nanostructures using spin-coated Ag ink nanoparticles and subsequent ICP etching. (b) Top-view SEM images of the randomly distributed Ag nanoparticles on Si substrate. The corresponding Ag ink ratios used are shown in the inset.Back to article page