Figure 4From: Heteroepitaxial growth of TiN film on MgO (100) by reactive magnetron sputteringTEM images of the cross section of the TiN/MgO. (a) Cross-sectional bright-field TEM micrograph. The discontinuous features at the middle region of TiN and at the TiN/NgO interface were artifacts due to FIB milling. (b) a corresponding SAED pattern from an epitaxial TiN film grown on the MgO (100) substrate. (c) High-resolution TEM showing the TiN/MgO interfacial region.Back to article page