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Table 1 Thicknesses estimated by fitting of the spectroscopic ellipsometry measurements of Si-QDSLs

From: Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix

Parameters 300°C 400°C 500°C 600°C
MSE 11.56 12.22 13.37 13.30
Ts (nm) 33.1 11.5 15.2 6.5
T (nm) 167.7 212.8 224.7 246.1