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Table 1 Morphology, density, diameter, length, thickness, and average aspect ratio of the grown ZnO structures

From: Seed/catalyst-free growth of zinc oxide on graphene by thermal evaporation: effects of substrate inclination angles and graphene thicknesses

Substrate

Substrate position

Temperature (°C)

Morphology

Density (cm −2 )

Diameter of nanorods/nanoneedles (nm)

Length of nanorods (nm)

Thickness (nm)

Average aspect ratio

SL graphene on SiO2/Si

90° inclined

600

Non-continuous nanoclusters

-

-

-

~93

-

This work

90° inclined

800

A mixture of vertically non-aligned and aligned nanorods

1.2 × 109

37–74

93–574

~40 (base structure)

~5.1

90° inclined

1,000

Randomly dispersed clusters

-

-

-

-

-

ML graphene on SiO2/ Si

90° inclined

600

Continuous clusters/layer

-

-

-

~1,062

-

This work

90° inclined

800

Nanorods

7.0 × 109

<150

<540

~90 (base structure)

~2.8

90° inclined

1,000

Thin film

-

-

-

~74

-

ML graphene SiO2/ Si by thermal evaporation [3]

45° inclined

600

Non-continuous nanoclusters

-

-

-

~200

-

45° inclined

800

Nanorods

6.9 × 109

<150

<540

~50 (base structure)

~2.8

45° inclined

1,000

Thin film

-

-

-

~60

-

Porous silicon by thermal evaporation [21]

Placed on source boat and facing downward

800

Nanorods

1.2 × 108

200–500

Not stated

-

Not stated

ML graphene on SiO2/Si by MOVPE [1]

Standard horizontal position

400

Nanorods

4.0 × 109

100 ± 10

1,000 ± 100

-

~10.0

  

600

Nanoneedles

8.0 × 109

90 ± 20

4,000 ± 600

-

~44.4

  

750

Nanoneedles

5.0 × 107

Not stated

3,500 ± 500

-

Not stated

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