Figure 2From: Surface properties and biocompatibility of nanostructured TiO2 film deposited by RF magnetron sputtering XRD patterns of TiO 2 samples at an RF power of 150 W at working pressures of (a) 3 Pa and (b) 5 Pa, without bias, and (c) 3 Pa at a substrate bias of −50 V. Back to article page