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Table 2 Thickness comparison between SE and TEM on 300 cycles Al ₂ O ₃ film

From: The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

	Thickness (nm)
	SE			TEM
Annealing temperature (°C)	SiO ₂	Al ₂ O ₃	RMS	Al ₂ O ₃	SiO ₂	RMS
As deposited	1.0	25.9	0.49	0.7	25.6	-
600	1.0	24.8	0.53	1.3	24.5	-
900	1.0	20.6	0.40	1.5	20.2	-

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