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Table 2 Thickness comparison between SE and TEM on 300 cycles Al 2 O 3 film

From: The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

  Thickness (nm)
SE TEM
Annealing temperature (°C) SiO 2 Al 2 O 3 RMS Al 2 O 3 SiO 2 RMS
As deposited 1.0 25.9 0.49 0.7 25.6 -
600 1.0 24.8 0.53 1.3 24.5 -
900 1.0 20.6 0.40 1.5 20.2 -