Figure 4From: The nanostructuring of surfaces and films using interference lithography and chalcogenide photoresist Diffraction efficiency of interference structures. Spectral dependence of the diffraction efficiency η (in unpolarized light) for the gratings recorded on annealed Ge25Se75 films: curves 1, 2, 3, and 4 correspond to samples recorded after the first, second, third, and fourth exposure-annealing cycles, accordingly.Back to article page