Figure 2From: High-resolution X-ray diffraction analysis of strain distribution in GaN nanowires on Si(111) substrate The calculated (002) 2θ/ω XDPs for GaN NWs. (a) The influence of the deformation magnitude (\( {\varepsilon}_o^{\left|\right|} \)) at the NW/substrate interface. (b) The influence of the deformation relaxation depth (L R ). The insets show the deformation profiles (defined by Equation 3) used for the calculation. The dashed line in (a) shows the XDP determined only by the size effect (without deformation).Back to article page