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Table 1 Detailed thickness information of rear-side passivation films

From: Investigation on the passivated Si/Al2O3 interface fabricated by non-vacuum spatial atomic layer deposition system

Cell type

SiO 2 (nm)

Al 2 O 3 (nm)

SiN x :H (nm)

Annealing temperature prior to cap SiN x :H (°C)

A

N/A

25

N/A

500

B

3

25

N/A

500

C

3

8

N/A

650

D

3

8

70

650

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