Figure 2From: Mie resonance-mediated antireflection effects of Si nanocone arrays fabricated on 8-in. wafers using a nanoimprint technique Schematic diagram of the NC array on an infinitely thick Si substrate. (a) The volume in the dashed lines indicates the unit cell used in the optical simulation. (b) Top view of the unit cell (the spacing between nearest neighbor NCs, D, is 300 nm).Back to article page